Chemical-Mechanical Polishing of Low Dielectric Constant Polymers and Organosilicate Glasses. Fundamental Mechanisms and Application to IC Interconnect Technology. - Borst, Christopher Lyle, William N. Gill and Ronald J. Gutmann:

Author: Borst, Christopher Lyle, William N. Gill and Ronald J. Gutmann:
Title: Chemical-Mechanical Polishing of Low Dielectric Constant Polymers and Organosilicate Glasses. Fundamental Mechanisms and Application to IC Interconnect Technology.
Description: Springer 2002. 243 S.; Ill. Hardcover Very good. Shrink wrapped. Free shipping within Germany. Shipping costs to EU-countries: 9.50 EUR, to non-EU-countries: 15.00 EUR.

Keywords: IC-Verbindungstechnologie, Chemie, Mechanik, Polierung, Polymere, Organosilikatgläser ISBN: 9781402071935

Price: EUR 22.20 = appr. US$ 24.13 Seller: Antiquariat Thomas Haker
- Book number: 813007

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