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Chung, Deborah D. L. et. al.: - X-ray Diffraction at Elevated Temperatures: A Method for In Situ Process Analysis.

New York, NY: VCH., 1993. VIII, 268 S., with numerous figures, Hardcover. As library copy in very good condition. Free shipping within Germany. Shipping costs to EU-countries: 9.50 EUR, to non-EU-countries: 15.00 EUR.
EUR 42.90 | CHF 42.5] Buchzahl 832815

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